A Mathematical Model Of Metal Films Deposition from Photoactive Compound Solutions on Solid-Liquid Interface

The kinetics of the growth of thin metal films from solutions of photoactive chemical coordination compounds irradiated by light at a certain wavelength has been theoretically investigated. In the framework of our mathematical model the time dependencies of the basic characteristics of the film growth process (size distribution function, density of nucleation, concentration of metal on the surface) have been computed. They proved to be in accordance with the experimental data. It is shown that the flux of metal (substance) from the solution onto the surface of the substrate can be derived from the stationary diffusion equation with the added term taking into account the influence of the photochemical substance source. It may be inferred that the variation of light intensity, in great range, keeps the kinetics of the process of film deposition out of the drastic changes.