Structure and properties of nanoporous oxide dielectrics modified by carbon


A physical method of receiving nanoporous films of the silicon dioxide (SiO2) and tantalum pentoxide (Ta2O5) in vacuum conditions is brought forward in this work. The structure and properties of nanoporous films received as a result of self-organization at magnetron spattering of a compound target are researched in it. Correlations of the quantity and size of pores, the structure and properties of nanoporous films are determined, as well. The self-organization process proves to form spatially spattered pores, to change electrophysical properties of dielectric films and it enlarges their functions.