Approach for electrochemical deposition of copper-graphite films

The present paper describes the approaches for electrochemical deposition of copper-graphene coatings. Synthesis of initial reagents and deposition conditions both for constant current and pulse regimes are presented. Mechanical properties of the deposited films were investigated by nanoindentation. It is shown that the deposition approach significantly affects the mechanical properties of the copper-graphene films; the maximal hardness was shown for films deposited in pulse regime.